Japanese Fujifilm to invest ₹800 crore in semiconductor materials manufacturing facility in India
NEW DELHI: Japanese Fujifilm said on Wednesday that it plans to invest ₹800 crore (or approximately $83 million) to set up a semiconductor materials manufacturing facility in India.
“Aligned with the government of India’s vision under the India Semiconductor Mission (ISM) 2.0, the project will follow a two-phase, staggered investment strategy aligned with industry growth and customer demand, with a total investment of approximately ₹800 crores (~US$83 million),” it said in a statement.
Phase 1 is scheduled to break ground in the financial year 2026, aiming for commercial production at the greenfield manufacturing facility in the fiscal year 2028.
