CM Vishnu Deo Sai laid foundation stone for India’s first GaN-based semiconductor plant in Raipur

In a significant step for India’s semiconductor and electronics manufacturing landscape, Chhattisgarh Chief Minister Vishnu Deo Sai on Friday laid the foundation stone for the country’s first ultra-edge technology-based Gallium Nitride (GaN)-based semiconductor fabrication unit in Nava Raipur.

Developed by Polymatech Electronics Limited with an investment of Rs 1,143 crore, the state-of-the-art facility spanning 3 lakh sq ft will produce high-frequency GaN chips designed to operate between 5.925 GHz and 13.75 GHz (Nodes N102–104), catering to advanced 5G and 6G telecommunications infrastructure and marking a major milestone in India’s technological journey, the officials in the know-how of the upcoming unit shared.