China claims chipmaking gear advance despite tightening US curbs: Report

China has claimed a breakthrough in the development of homegrown chipmaking equipment, an important step in overcoming US sanctions designed to thwart Beijing’s semiconductor goals.

State-linked organisations are advised to use a new laser-based immersion lithography machine with a resolution of 65 nanometers or better, the Ministry of Industry and Information Technology said in an announcement this month. Though the note doesn’t specify the supplier, the spec marks a significant step up from the previous most-advanced indigenous equipment — developed by Shanghai Micro Electronics Equipment Group Co. — which stood at around 90nm.